Patent · US Active

Gas distribution ceramic heater for deposition chamber

US12016092B2 · kind B2 · utility

0Cited by
4References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 30, 2020
Grant dateJun 18, 2024
Priority date
Expiry dateJan 19, 2043

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05B6/62
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

Embodiments of a lid heater for a deposition chamber are provided herein. In some embodiments, a lid heater for a deposition chamber includes a ceramic heater body having a first side opposite a second side, wherein the ceramic heater body includes a first plurality of gas channels extending from one or more first gas inlets on the first side, wherein each of the one or more first gas inlets extend to a plurality of first gas outlets on the second side; a heating element embedded in the ceramic heater body; and an RF electrode embedded in the ceramic heater body proximate the second side, wherein the first plurality of gas channels extend through the RF electrode.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.