ALD cycle time reduction using process chamber lid with tunable pumping
US12054826B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 20, 2023 |
| Grant date | Aug 6, 2024 |
| Priority date | — |
| Expiry date | Jul 20, 2043 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4408
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Process chamber lids having a pumping liner with a showerhead and gas funnel within an open central region are described. The showerhead is spaced a distance from the gas funnel to form a gap and the gas funnel has an opening to provide a flow of gas into the gap. The gas funnel includes a plurality of apertures extending from the front surface to a common region adjacent the back surface of the gas funnel. A purge ring is in contact with the back surface of the gas funnel and aligned so that a circular channel formed in the bottom surface of the purge ring body is positioned adjacent the common area of the apertures in the gas funnel.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.