Near-field lithography immersion system, immersion unit and interface module thereof
US12078937B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 15, 2022 |
| Grant date | Sep 3, 2024 |
| Priority date | — |
| Expiry date | Apr 15, 2042 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/7035
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Provided is an near-field lithography immersion system, including: an immersion unit including: a liquid flow channel and a gas flow channel configured to apply gas to confine an immersion liquid provided by the liquid flow channel into an exposure field; at least two interface modules, the interface module includes a gas connector, a liquid connector and a brake connector, the gas connector and the liquid connector are correspondingly connected to the gas flow channel and the liquid flow channel, respectively, the brake connector is configured to control an assembly and a disassembly of the immersion unit, and the interface module is detachably connected to the immersion unit; and a mask loading module including a mask base plate and a mask, the immersion liquid is guided to an edge of the mask from below the mask base plate to form an immersion field between the mask and a substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.