Methods of greytone imprint lithography to fabricate optical devices
US12111572B2 · kind B2 · utility
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2References
20Claims
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Key dates
| Filing date | Jun 12, 2023 |
| Grant date | Oct 8, 2024 |
| Priority date | — |
| Expiry date | Jun 12, 2043 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B2027/0178
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of imprinting a pattern on a substrate is provided. The method includes forming a first pattern on a plurality of masters using a method other than imprinting, the first pattern including a plurality of patterned features of varying sizes; measuring the patterned features at a plurality of locations on each of the masters; selecting a first master of the plurality of masters based on the measurements of the patterned features on each of the masters; using the first master to form a second pattern on an imprint template; and imprinting the first pattern on a first device with the imprint template.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.