Time-resolved OES data collection
US12158374B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 25, 2022 |
| Grant date | Dec 3, 2024 |
| Priority date | — |
| Expiry date | Jan 7, 2043 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32146
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method of processing a substrate that includes: exposing the substrate in a plasma processing chamber to a plasma powered by applying a first power to a first electrode of a plasma processing chamber; turning OFF the first power to the first electrode after the first time duration; while the first power is OFF, applying a second power to a second electrode of the plasma processing chamber for a second time duration, the second time duration being shorter than the first time duration, an energy of the second power over the second time duration is less than an energy of the first power over the first time duration by a factor of at least 2; and detecting an optical emission spectrum (OES) from species in the plasma processing chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.