Integrated substrate measurement system to improve manufacturing process performance
US12191176B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 15, 2023 |
| Grant date | Jan 7, 2025 |
| Priority date | — |
| Expiry date | Jun 15, 2043 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P90/02
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A process recipe associated with a substrate at a manufacturing system is identified. A first set of measurements for the substrate is obtained from a substrate measurement subsystem. A second set of measurements for the substrate is obtained from one or more sensors of a chamber of the manufacturing system. A determination is made based on the obtained first set of measurements and the obtained second set of measurements of whether to modify the process recipe by at least one of modifying an operation of the process recipe or generating an instruction to prevent completion of execution of one or more operations of the process recipe.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.