Patent · US Active

Epitaxial deposition chamber

US12324061B2 · kind B2 · utility

0Cited by

40References

20Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Shu-Kwan LAU · Sunnyvale, US
Brian H. Burrows · San Jose, US
Zhiyuan Ye · San Jose, US
Richard O. Collins · Santa Clara, US
Enle CHOO · Saratoga, US
Danny D. WANG · San Jose, US
Shainish NELLIKKA · Kanchinakote, IN
Toshiyuki Nakagawa · Tokyo, JP
Abhishek Dube · Fishkill, US
Ala Moradian · Sunnyvale, US
Kartik Shah · Saratoga, US

Key dates

Filing date	Apr 6, 2021
Grant date	Jun 3, 2025
Priority date	—
Expiry date	Jan 31, 2042

Classification

Technology area (CPC H)Electricity
CPC primaryH05B3/0047
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A process chamber includes a chamber body having a ceiling disposed above a floor with a chassis and an injector ring disposed therebetween. Upper and lower clamp rings secure the upper and floors, respectively, in place. An upper heating module is coupled to the upper clamp ring above the ceiling. A lower heating module is coupled to the lower clamp ring below the floor.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.