Substrate loading apparatus for a CVD process
US5092728A · kind A · utility
42Cited by
11References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 24, 1989 |
| Grant date | Mar 3, 1992 |
| Priority date | — |
| Expiry date | Feb 24, 2009 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B25/10
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Each substrate is loaded into a receiving chamber upon a positionable platform, which platform is in sealed relationship with the receiving chamber to permit purging of the receiving chamber prior to transport of the loaded substrate(s) to a feed chamber. The platform is positioned from the receiving chamber into the feed chamber wherefrom the substrates are off loaded. A cassette containing a plurality of stacked substrates may be loaded upon the platform to transport a plurality of substrates into the feed chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.