Method for loading a substrate into a GVD apparatus
US5156521A · kind A · utility
18Cited by
11References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 25, 1991 |
| Grant date | Oct 20, 1992 |
| Priority date | — |
| Expiry date | Jun 25, 2011 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B25/10
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method for loading a substrate into a receiving chamber upon a positionable platform, which platform is in sealed relationship with the receiving chamber, permits purging of the receiving chamber prior to transport of the loaded substrate(s) to a feed chamber. The platform is positioned from the receiving chamber into the feed chamber to off load the substrates. A cassette containing a plurality of stacked substrates may be loaded upon the platform to transport a plurality of substrates into the feed chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.