VHF/UHF reactor system
US5210466A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 13, 1992 |
| Grant date | May 11, 1993 |
| Priority date | — |
| Expiry date | Mar 13, 2012 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K2201/10689
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma processing reactor is disclosed which incorporates an integral co-axial transmission line structure that effects low loss, very short transmission line coupling of ac power to the plasma chamber and therefore permits the effective use of VHF/UHF frequencies for generating a plasma. The use of VHF/UHF frequencies within the range 50-800 megahertz provides commercially viable processing rates (separate and simultaneous etching and deposition) and substantial reduction in sheath voltages compared to conventional frequencies such as 13.56 MHz. As a result, the probability of damaging electrically sensitive small geometry devices is reduced.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.