Uniformity for magnetically enhanced plasma chambers
US5308417A · kind A · utility
40Cited by
6References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 12, 1991 |
| Grant date | May 3, 1994 |
| Priority date | — |
| Expiry date | Sep 12, 2011 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3266
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma reactor containing within the processing chamber pieces of magnetic material located to reduce and/or substantially eliminate systematic processing rate nonuniformities. These pieces are placed inside the chamber or attached inside of the pedestal adjacent to the top of the pedestal, where the wafer is to be located for processing. The thickness, shape and magnetic permeabilities of these magnetic pieces are selected to optimize process uniformity.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.