Diamond-like carbon films from a hydrocarbon helium plasma
US5470661A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jan 7, 1993 |
| Grant date | Nov 28, 1995 |
| Priority date | — |
| Expiry date | Jan 7, 2013 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/30
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to an improved method of depositing a diamond-like carbon film onto a substrate by low temperature plasma-enhanced chemical vapor deposition (PECVD) from a hydrocarbon/helium plasma. More specifically, the diamond like carbon films of the present invention are deposited onto the substrate by employing acetylene which is heavily diluted with helium as the plasma gas. The films formed using the process of the present invention are characterized as being amorphous and having dielectric strengths comparable to those normally observed for diamond films. More importantly, however is that the films produced herein are thermally stable, optically transparent, absorbent in the ultraviolet range and hard thus making them extremely desirable for a wide variety of applications.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.