Electronically tuned matching networks using adjustable inductance elements and resonant tank circuits
US5572170A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 22, 1995 |
| Grant date | Nov 5, 1996 |
| Priority date | — |
| Expiry date | Aug 22, 2015 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01F2029/143
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma processing system including a plasma processing chamber; an antenna circuit including a source antenna positioned relative to the processing chamber so as to couple energy into a plasma within the chamber during processing, the antenna circuit having a first terminal and a second terminal with the source antenna electrically coupled between the first and second terminals; and a local impedance transforming network connected to the antenna circuit, the local impedance transforming network including a first capacitor connected between the first terminal and a grounded node, and a second capacitor connected between the second terminal and the grounded node.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.