Douglas A. Buchberger, Jr.
121Patents
32h-index
139Co-inventors
93Inventor score
Filing activity: Jan 23, 1992 → Feb 9, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6054013A | Parallel plate electrode plasma reactor having an inductive antenna and adjustable radial distribution of plasma ion density | Electricity | 497 | Expired |
| US9741546B2 | Symmetric plasma process chamber | Electricity | 365 | Active |
| US8937800B2 | Electrostatic chuck with advanced RF and temperature uniformity | Electricity | 289 | Active |
| US6252354A | RF tuning method for an RF plasma reactor using frequency servoing and power, voltage, current or DI/DT control | Electricity | 228 | Expired |
| US6074512A | Inductively coupled RF plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners | Electricity | 189 | Expired |
| US6900596B2 | Capacitively coupled plasma reactor with uniform radial distribution of plasma | Electricity | 182 | Expired |
| US6077384A | Plasma reactor having an inductive antenna coupling power through a parallel plate electrode | Electricity | 175 | Expired |
| US5916689A | Electrostatic chuck with an impregnated, porous layer that exhibits the Johnson-Rahbeck effect | Emerging Cross-Sectional Technologies | 160 | Expired |
| US8633423B2 | Methods and apparatus for controlling substrate temperature in a process chamber | Emerging Cross-Sectional Technologies | 121 | Active |
| US5874361A | Method of processing a wafer within a reaction chamber | Electricity | 110 | Expired |
| US5187454A | Electronically tuned matching network using predictor-corrector control system | Electricity | 109 | Expired |
| US7196283B2 | Plasma reactor overhead source power electrode with low arcing tendency, cylindrical gas outlets and shaped surface | Electricity | 91 | Expired |
| US6894245B2 | Merie plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression | Electricity | 70 | Expired |
| US6586886B1 | Gas distribution plate electrode for a plasma reactor | Electricity | 68 | Expired |
| US5684669A | Method for dechucking a workpiece from an electrostatic chuck | Electricity | 67 | Expired |
| US5392018A | Electronically tuned matching networks using adjustable inductance elements and resonant tank circuits | Electricity | 61 | Expired |
| US6024826A | Plasma reactor with heated source of a polymer-hardening precursor material | Electricity | 56 | Expired |
| US7030335B2 | Plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression | Electricity | 53 | Expired |
| US6165311A | Inductively coupled RF plasma reactor having an overhead solenoidal antenna | Electricity | 50 | Expired |
| US6063233A | Thermal control apparatus for inductively coupled RF plasma reactor having an overhead solenoidal antenna | Electricity | 50 | Expired |
| US6623596B1 | Plasma reactor having an inductive antenna coupling power through a parallel plate electrode | Electricity | 46 | Expired |
| US5574410A | Electronically tuned matching networks using adjustable inductance elements and resonant tank circuits | Electricity | 43 | Expired |
| US5800871A | Electrostatic chuck with polymeric impregnation and method of making | Emerging Cross-Sectional Technologies | 43 | Expired |
| US7649729B2 | Electrostatic chuck assembly | Electricity | 41 | Active |
| US7968469B2 | Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformity | Electricity | 39 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.