John Trow
27Patents
22h-index
28Co-inventors
81Inventor score
Filing activity: Jan 23, 1992 → Oct 2, 2001
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6054013A | Parallel plate electrode plasma reactor having an inductive antenna and adjustable radial distribution of plasma ion density | Electricity | 497 | Expired |
| US5556501A | Silicon scavenger in an inductively coupled RF plasma reactor | Electricity | 246 | Expired |
| US6252354A | RF tuning method for an RF plasma reactor using frequency servoing and power, voltage, current or DI/DT control | Electricity | 228 | Expired |
| US6074512A | Inductively coupled RF plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners | Electricity | 189 | Expired |
| US6077384A | Plasma reactor having an inductive antenna coupling power through a parallel plate electrode | Electricity | 175 | Expired |
| US5350479A | Electrostatic chuck for high power plasma processing | Emerging Cross-Sectional Technologies | 149 | Expired |
| US6518195B1 | Plasma reactor using inductive RF coupling, and processes | Electricity | 113 | Expired |
| US5187454A | Electronically tuned matching network using predictor-corrector control system | Electricity | 109 | Expired |
| US6488807B1 | Magnetic confinement in a plasma reactor having an RF bias electrode | Electricity | 99 | Expired |
| US6068784A | Process used in an RF coupled plasma reactor | Electricity | 96 | Expired |
| US5824607A | Plasma confinement for an inductively coupled plasma reactor | Electricity | 84 | Expired |
| US6251792A | Plasma etch processes | Electricity | 82 | Expired |
| US5346579A | Magnetic field enhanced plasma processing chamber | Electricity | 70 | Expired |
| US6545420B1 | Plasma reactor using inductive RF coupling, and processes | Electricity | 61 | Expired |
| US5392018A | Electronically tuned matching networks using adjustable inductance elements and resonant tank circuits | Electricity | 61 | Expired |
| US6165311A | Inductively coupled RF plasma reactor having an overhead solenoidal antenna | Electricity | 50 | Expired |
| US6623596B1 | Plasma reactor having an inductive antenna coupling power through a parallel plate electrode | Electricity | 46 | Expired |
| US5349313A | Variable RF power splitter | Electricity | 44 | Expired |
| US5574410A | Electronically tuned matching networks using adjustable inductance elements and resonant tank circuits | Electricity | 43 | Expired |
| US5539609A | Electrostatic chuck usable in high density plasma | Electricity | 32 | Expired |
| US5583737A | Electrostatic chuck usable in high density plasma | Electricity | 32 | Expired |
| US6524432B1 | Parallel-plate electrode plasma reactor having an inductive antenna and adjustable radial distribution of plasma ion density | Electricity | 24 | Expired |
| US6444085B1 | Inductively coupled RF plasma reactor having an antenna adjacent a window electrode | Electricity | 22 | Expired |
| US5572170A | Electronically tuned matching networks using adjustable inductance elements and resonant tank circuits | Electricity | 20 | Expired |
| US6736931B2 | Inductively coupled RF plasma reactor and plasma chamber enclosure structure therefor | Electricity | 20 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.