Puncture resistant electrostatic chuck

US5729423A · kind A · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Arik Donde · Dallas, US
• Hyman J. Levinstein · Berkeley Heights, US
• Robert Wu · Pleasanton, US
• Andreas Hegedus · Burlingame, US
• Edwin C. Weldon · Los Gatos, US
• Shamouil Shamouilian · San Jose, US
• Jon Clinton · San Jose, US
• Surinder Bedi · Fremont, US

Key dates

• Filing date: Nov 25, 1996
• Grant date: Mar 17, 1998
• Expiry date: Nov 25, 2016

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T279/23
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

A puncture resistant electrostatic chuck (20) is described. The chuck (20) comprises at least one electrode (25); and a composite insulator (30) covering the electrode. The composite insulator comprises a matrix material having a conformal holding surface (50) capable of conforming to the substrate (35) under application of an electrostatic force generated by the electrode to reduce leakage of heat transfer fluid held between the substrate and the holding surface. A hard puncture resistant layer, such a layer of fibers or an aromatic polyamide layer, is positioned below the holding surface (50) and is sufficiently hard to increase the puncture resistance of the composite insulator.