Method and apparatus for X-ray analyses
US5877498A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 15, 1997 |
| Grant date | Mar 2, 1999 |
| Priority date | — |
| Expiry date | Jul 15, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2807
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An X-ray analyzing method for inspecting opening states of fine holes comprises the steps of: irradiating a finely converged electron beam into a first fine hole, observing an X-ray emitted from the inside of said first fine hole in order to obtain an first X-ray analysis data about the residue substance existing at the bottom of said first fine hole; irradiating a finely converged electron beam into a second fine hole, observing an X-ray emitted from the inside of said second fine hole in order to obtain an second X-ray analysis data about the residue substance existing at the bottom of said second fine hole; and comparing said first X-ray analysis data with said second X-ray analysis data, forming a judgment as to whether or not a difference between said first and second analysis data is smaller than a predetermined threshold value and using an outcome of said judgment to determine the opening states of said first and second fine holes. The X-ray observations are carried out by detecting only the X-rays emitted within the angular range -.theta. to +.theta. where notation .theta. is an angle formed with a center axis of the irradiated electron beam and so defined that tan .theta. …
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.