Reticle that compensates for radiation-induced lens error in a photolithographic system

US5888675A · kind A · utility

Assignee

• Advanced Micro Devices, Inc. · US

Inventors

• Bradley T. Moore · Austin, US
• Robert Dawson · Austin, US
• H. Jim Fulford · Austin, US
• Mark I. Gardner · Mabank, US
• Frederick N. Hause · Austin, US
• Mark W. Michael · Cedar Park, US
• Derick J. Wristers · Austin, US

Key dates

• Filing date: Dec 4, 1996
• Grant date: Mar 30, 1999
• Expiry date: Dec 4, 2016

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70241
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A reticle provides an image pattern and compensates for a lens error in a photolithographic system. The reticle is structurally modified using image displacement data indicative of the lens error. The reticle can be structurally modified by adjusting the configuration (or layout) of radiation-transmitting regions, for instance by adjusting a chrome pattern on the top surface of a quartz base. Alternatively, the reticle can be structurally modified by adjusting the curvature of the reticle, for instance by providing a chrome pattern on the top surface of a quartz base and grinding away portions of the bottom surface of the quartz base. The image displacement data may also vary as a function of lens heating so that the reticle compensates for lens heating associated with the reticle pattern.