Resist processing apparatus
US6033475A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 26, 1995 |
| Grant date | Mar 7, 2000 |
| Priority date | — |
| Expiry date | Dec 26, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/162
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The present invention has a resist processing apparatus for supplying a processing solution onto an object to be processed to perform a resist process, including a processing solution supply nozzle for supplying the processing solution onto the object to be processed, a processing solution feeding arrangement for feeding the processing solution to the processing solution supply nozzle, a processing solution flow path arranged to extend between the processing solution feeding arrangement and the processing solution supply nozzle, and a processing solution deaeration mechanism arranged at an intermediate portion of the processing solution flow path to deaerate the processing solution. The processing solution deaeration mechanism includes a closed vessel, an inlet port for introducing the processing solution into the closed vessel, a member arranged in the closed vessel and having a gas-liquid separation function, and an evacuating arrangement for evacuating the interior of the closed vessel to deaerate the processing solution through the member having the gas-liquid separation function. Gaseous components are separated from the processing solution, and an outlet port feeds the proces…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.