High temperature resistive heater for a process chamber
US6066836A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 23, 1996 |
| Grant date | May 23, 2000 |
| Priority date | — |
| Expiry date | Sep 23, 2016 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF27D2099/0008
- WIPO fieldThermal processes and apparatus
- WIPO sectorMechanical engineering
Abstract
A resistive heating structure for a processing apparatus such as a chemical vapor deposition chamber. The system includes a resistive heating substrate holder including a support surface and a support shaft, the holder being comprised of a first material. The support surface includes a resistive heating element. The support shaft has a given length, and through bores for allowing a thermocouple to engage the support surface and electrical conductors to couple to the resistive heating element in the support surface. A metallic mounting structure is coupled to the support shaft and secured to the process apparatus to create a sealed environment within the holder and mounting structure to protect the electrical leads and thermocouple from the process environment.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.