Optical view port for chemical mechanical planarization endpoint detection
US6146242A · kind A · utility
67Cited by
11References
2Claims
0Family size
Assignee
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Key dates
| Filing date | Jun 11, 1999 |
| Grant date | Nov 14, 2000 |
| Priority date | — |
| Expiry date | Jun 11, 2019 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24D7/12
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
An optical endpoint system for a CMP system with a viewport located off-center on the platen, said view port being adjustable in height so that the window of the viewport can be made flush with the top of the polishing pad.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.