Electrostatic chuck having gas cavity and method

US6310755A · kind A · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Arnold Kholodenko · San Francisco, US
• Shamouil Shamouilian · San Jose, US
• You Wang · Cupertino, US
• Wing Cheng · Sunnyvale, US
• Alexander Veytser · Mountain View, US
• Surinder Bedi · Fremont, US
• Kadthala Ramaya Narendrnath · San Jose, US
• Semyon L. Kats · San Francisco, US
• Dennis S. Grimard · Ann Arbor, US
• Ananda H. Kumar · Fremont, US

Key dates

• Filing date: May 7, 1999
• Grant date: Oct 30, 2001
• Expiry date: May 7, 2019

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C22C2204/00
• WIPO field: Materials, metallurgy
• WIPO sector: Chemistry

Abstract

An electrostatic chuck 55 has an electrostatic member 100 including a dielectric 115 having a surface 120 adapted to receive the substrate 30. The dielectric 115 covers an electrode 105 that is chargeable to electrostatically hold the substrate 30. A support 190 below the electrostatic member 100 has a cavity 300 adapted to hold a gas to serve as a thermal insulator to regulate the flow of heat from the electrostatic chuck 55 to a surface 120 of the chamber 25. The cavity 300 has a cross-sectional profile that is shaped to provide a predetermined temperature profile across the substrate 30.