Method and apparatus for reducing thermal gradients within a substrate support
US6469283B1 · kind B1 · utility
69Cited by
13References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 4, 1999 |
| Grant date | Oct 22, 2002 |
| Priority date | — |
| Expiry date | May 18, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67103
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method and apparatus for reducing the thermal gradients within substrate support such as a ceramic wafer support pedestal. Specifically, the present invention is a heater controller that limits the amount of power that is applied to a resistive heater embedded within a ceramic pedestal. The heater controller comprises the necessary circuitry for limiting the amount of power applied to one or more zones with respect to a single other zone. Said heater controller also contains the necessary circuitry to detect faulty or misconnected wires between heater controller and the zones to be heated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.