Patent · US Expired

Optical view port for chemical mechanical planarization endpoint detection

US6488568B1 · kind B1 · utility

18Cited by
12References
12Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 14, 2000
Grant dateDec 3, 2002
Priority date
Expiry dateJan 20, 2021

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB24D7/12
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

An optical endpoint system for a CMP system with a viewport located off-center on the platen, said view port being adjustable in height so that the window of the viewport can be made flush with the top of the polishing pad.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.