Electrostatic chuck having heater and method

US6538872B1 · kind B1 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• You Wang · Cupertino, US
• Shamouil Shamouilian · San Jose, US
• Arnold Kholodenko · San Francisco, US
• Alexander Veytser · Mountain View, US
• Surinder Bedi · Fremont, US
• Kadthala Ramaya Narendrnath · San Jose, US
• Semyon L. Kats · San Francisco, US
• Dennis S. Grimard · Ann Arbor, US
• Wing Cheng · Sunnyvale, US
• Ananda H. Kumar · Fremont, US

Key dates

• Filing date: Nov 5, 2001
• Grant date: Mar 25, 2003
• Expiry date: Nov 21, 2021

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/67103
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

An electrostatic chuck 55 for holding a substrate 30 comprises an electrostatic member 100 made from a dielectric 115 covering an electrode 105 that is chargeable to electrostatically hold the substrate 30. A base 175 that includes a heater 235 is joined to the electrostatic member 100. The base may be made from a composite material, such as a porous ceramic infiltrated with the metal, and may be joined to the electrostatic member by a bond layer.