Inductive antenna for a plasma reactor producing reduced fluorine dissociation
US6652712B2 · kind B2 · utility
25Cited by
1References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 19, 2001 |
| Grant date | Nov 25, 2003 |
| Priority date | — |
| Expiry date | Dec 19, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/321
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An inductive antenna of a plasma reactor for processing a semiconductor wafer is connected to a radio frequency (RF) power source, and consists of a conductor arranged in successive loops that wind in opposing directions, adjacent pairs of the successive loops having facing portions in which current flow is parallel, the facing portions being sufficiently close to at least nearly share a common current path, whereby to form transitions across the facing portions between opposing magnetic polarizations.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.