Methods and systems for determining at least four properties of a specimen
US6694284B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 20, 2001 |
| Grant date | Feb 17, 2004 |
| Priority date | — |
| Expiry date | Dec 21, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31701
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, at least four properties of a specimen such as critical dimension, overlay, a presence of macro defects, and thin film characteristics. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.