Atmospheric substrate processing apparatus for depositing multiple layers on a substrate
US6841006B2 · kind B2 · utility
22Cited by
24References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 23, 2001 |
| Grant date | Jan 11, 2005 |
| Priority date | — |
| Expiry date | Aug 23, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S414/139
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A substrate processing apparatus is disclosed. In one embodiment, the apparatus includes a first atmospheric deposition station and a second atmospheric deposition station. The second atmospheric deposition station comprises an atmospheric pressure vapor deposition chamber. A substrate handling system is adapted to transfer substrates between the first and the second atmospheric deposition stations.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.