John Parks
31Patents
6h-index
44Co-inventors
65Inventor score
Filing activity: Nov 2, 1998 → Jun 14, 2013
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6176198A | Apparatus and method for depositing low K dielectric materials | Electricity | 265 | Expired |
| US6418874B1 | Toroidal plasma source for plasma processing | Electricity | 203 | Expired |
| US7191787B1 | Method and apparatus for semiconductor wafer cleaning using high-frequency acoustic energy with supercritical fluid | Emerging Cross-Sectional Technologies | 75 | Expired |
| US6841006B2 | Atmospheric substrate processing apparatus for depositing multiple layers on a substrate | Emerging Cross-Sectional Technologies | 22 | Expired |
| US7389783B2 | Proximity meniscus manifold | Emerging Cross-Sectional Technologies | 18 | Expired |
| US6712020B2 | Toroidal plasma source for plasma processing | Electricity | 7 | Expired |
| US8522799B2 | Apparatus and system for cleaning a substrate | Performing Operations; Transporting | 6 | Active |
| US7648584B2 | Method and apparatus for removing contamination from substrate | Physics | 6 | Active |
| US7350315B2 | Edge wheel dry manifold | Electricity | 5 | Expired |
| US7293571B2 | Substrate proximity processing housing and insert for generating a fluid meniscus | Emerging Cross-Sectional Technologies | 4 | Expired |
| US8328942B2 | Wafer heating and temperature control by backside fluid injection | Electricity | 4 | Active |
| US7758404B1 | Apparatus for cleaning edge of substrate and method for using the same | Performing Operations; Transporting | 3 | Active |
| US7089687B2 | Wafer edge wheel with drying function | Electricity | 3 | Expired |
| US7392815B2 | Chamber for wafer cleaning and method for making the same | Emerging Cross-Sectional Technologies | 3 | Expired |
| US9117860B2 | Controlled ambient system for interface engineering | Electricity | 3 | Active |
| US7591613B2 | Method and apparatus for transporting a substrate using non-newtonian fluid | Electricity | 2 | Active |
| US7416370B2 | Method and apparatus for transporting a substrate using non-Newtonian fluid | Electricity | 2 | Expired |
| US7357115B2 | Wafer clamping apparatus and method for operating the same | Emerging Cross-Sectional Technologies | 2 | Expired |
| US8314027B2 | Wafer electroless plating system and associated methods | Electricity | 1 | Active |
| US8555903B2 | Method and apparatus for removing contamination from substrate | Physics | 1 | Active |
| US8069813B2 | Wafer electroless plating system and associated methods | Electricity | 1 | Active |
| US7153388B2 | Chamber for high-pressure wafer processing and method for making the same | Emerging Cross-Sectional Technologies | 1 | Expired |
| US8485120B2 | Method and apparatus for wafer electroless plating | Electricity | 1 | Active |
| US7604011B2 | Method and apparatus for semiconductor wafer cleaning using high-frequency acoustic energy with supercritical fluid | Emerging Cross-Sectional Technologies | 1 | Active |
| US7254900B2 | Wafer edge wheel with drying function | Electricity | 1 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.