Patent · US Expired

Assembly comprising a plurality of mask containers, manufacturing system for manufacturing semiconductor devices, and method

US6895294B2 · kind B2 · utility

5Cited by
8References
19Claims
0Family size

Assignees

Inventors

Key dates

Filing dateDec 4, 2000
Grant dateMay 17, 2005
Priority date
Expiry dateNov 28, 2022

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/70741
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

The present invention relates to a system for the manufacture of semiconductor devices by lithography, and in particular to an assembly of mask containers for use in such a system. The system comprises: a plurality of mask containers adapted to engage with one another such that two or more containers can be carried together as a stack; a plurality of lithography bays; a transport rail system for carrying the containers between different lithography bays. Each lithography bay has a transmitter/receiver unit for communicating lithography data with a tracking device located in each container, allowing for more efficient mask management. The transportation of the containers in stacks results in an improvement in efficiency.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.