Circuit pattern inspection method and apparatus
US6898305B2 · kind B2 · utility
19Cited by
8References
24Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 22, 2001 |
| Grant date | May 24, 2005 |
| Priority date | — |
| Expiry date | Dec 15, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present invention provides techniques, including a method and system, for inspecting for defects in a circuit pattern on a semi-conductor material. One specific embodiment provides a trial inspection threshold setup method, where the initial threshold is modified after a defect analysis of trial inspection stored data. The modified threshold is then used as the threshold in actual inspection.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.