Method, system, and medium for handling misrepresentative metrology data within an advanced process control system
US6999836B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 1, 2003 |
| Grant date | Feb 14, 2006 |
| Priority date | — |
| Expiry date | Aug 6, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG05B15/02
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
A system, method and medium of controlling a semiconductor manufacturing tool using a feedback control mechanism. The feedback control mechanism includes features for receiving data points relating to an output of the tool. The data points include a current data point and at least one previous data point. The feedback control mechanism also includes features for determining whether the current data point is an erroneous outlier by comparing the current data point to a statistical representation of the at least one previous data point, and based on whether the at least one previous data point is an outlier. The feedback control mechanism further includes features for disregarding the current data point in calculating a feedback value of the feedback control mechanism if the current data point is determined as an erroneous outlier.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.