Patent · US Expired

Method and system for improving exposure uniformity in a step and repeat process

US7006195B2 · kind B2 · utility

2Cited by

2References

2Claims

0Family size

Assignee

Advanced Micro Devices, Inc. · US

Inventors

Jan Raebiger · Dresden, DE
Heiko Wagner · Dresden, DE
Uwe Schulze · Dresden, DE
Rolf Seltmann · Dresden, DE

Key dates

Filing date	Jul 23, 2003
Grant date	Feb 28, 2006
Priority date	—
Expiry date	Sep 24, 2023

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70625
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An advanced control system for a photolithography tool that receives measurement data relating to inline parameters varying with position on a substrate surface. The position sensitive measurement data is used to establish a position dependent target offset for an exposure map, thereby effectively compensating for substrate non-uniformities. Since the inline measurement data is available significantly earlier in comparison to electrical measurement data of a completed circuit element, a more accurate exposure map may be obtained taking into account the process history of the substrates.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.