Stepped reflector plate
US7041931B2 · kind B2 · utility
11Cited by
13References
32Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 24, 2002 |
| Grant date | May 9, 2006 |
| Priority date | — |
| Expiry date | Apr 11, 2023 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67115
- WIPO fieldThermal processes and apparatus
- WIPO sectorMechanical engineering
Abstract
In a system for thermal processing of a semiconductor substrate, a reflector plate has a stepped surface facing the substrate during heating and cooling of the substrate. The raised surface of the reflector plate has reduced reflectivity, providing advantages during, among other things, cooling of the substrate. The reflector plate also includes a number of recesses to which one or more pyrometers are coupled. These recesses have a highly reflective surface, providing advantages in the performance of the pyrometers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.