High repetition rate laser produced plasma EUV light source
US7087914B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 17, 2004 |
| Grant date | Aug 8, 2006 |
| Priority date | — |
| Expiry date | Aug 9, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0084
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The target tracking system may provide information enabling the creation of a laser firing control signal, and may comprise a droplet detector comprising a collimated light source directed to intersect a point on a projected delivery path of the target, having a respective oppositely disposed light detector detecting the passage of the target through the respective point, or a detector comprising a linear array of a plurality of photo-sensitive elements aligned to a coordinate axis, the light from the light source intersecting a p…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.