Defect diagnosis for semiconductor integrated circuits
US7089514B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 10, 2004 |
| Grant date | Aug 8, 2006 |
| Priority date | — |
| Expiry date | Dec 11, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01R31/318342
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for defect diagnosis of semiconductor chip. The method comprises the steps of (a) identifying M design structures and N physical characteristics of the circuit design, wherein M and N are positive integers, wherein each design structure of the M design structures is testable as to pass or fail, and wherein each physical characteristic of the N physical characteristics is present in at least one design structure of the M design structures; (b) for each design structure of the M design structures of the circuit design, determining a fail rate and determining whether the fail rate is high or low; and (c) if every design structure of the M design structures in which a physical characteristic of the N physical characteristics is present has a high fail rate, then flagging the physical characteristic as being likely to contain at least a defect.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.