Method and apparatus for controlling darkspace gap in a chamber
US7097744B2 · kind B2 · utility
9Cited by
21References
47Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 12, 2003 |
| Grant date | Aug 29, 2006 |
| Priority date | — |
| Expiry date | Aug 14, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/34
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
In one embodiment, a target alignment surface disposed on a target support mechanically engages a darkspace shield alignment surface disposed on a darkspace shield as the target is lodged into a chamber body. The respective alignment surfaces are shaped and positioned so that the darkspace shield is physically moved to a desired aligned position as the alignment surfaces engage each other. In this manner a darkspace shield may be directly aligned to a target within a semiconductor fabrication chamber to provide a suitable darkspace gap between the target and the darkspace shield.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.