Method for preventing and cleaning ruthenium-containing deposits in a CVD apparatus
US7107998B2 · kind B2 · utility
45Cited by
4References
27Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 16, 2003 |
| Grant date | Sep 19, 2006 |
| Priority date | — |
| Expiry date | Aug 19, 2024 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4405
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Carbon monoxide gas is provided in a ruthenium-deposition apparatus to clean undesired ruthenium-containing deposits from apparatus surfaces. Carbon monoxide gas is mixed with reactant gases in apparatus tubing and in a ruthenium-deposition reaction chamber to inhibit formation of undesired ruthenium deposits on apparatus surfaces and to remove ruthenium deposits.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.