Methods and systems for processing a substrate using a dynamic liquid meniscus
US7127831B2 · kind B2 · utility
5Cited by
15References
27Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 22, 2005 |
| Grant date | Oct 31, 2006 |
| Priority date | — |
| Expiry date | Dec 22, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A system and method of moving a meniscus from a first surface to a second surface includes forming a meniscus between a head and a first surface. The meniscus can be moved from the first surface to an adjacent second surface, the adjacent second surface being parallel to the first surface. The system and method of moving the meniscus can also be used to move the meniscus along an edge of a substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.