System and method for design rule creation and selection
US7194725B1 · kind B1 · utility
29Cited by
15References
22Claims
0Family size
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Key dates
| Filing date | Apr 2, 2004 |
| Grant date | Mar 20, 2007 |
| Priority date | — |
| Expiry date | Apr 5, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P90/02
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method of producing design rules including generating a plurality of parametrically varying geometric layouts and simulating how each geometric layout will pattern on a wafer. Edges of structures within the simulated geometric layouts can be classified based on manufacturability and design rules can be created to disallow layouts demonstrating poor manufacturability.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.