Lithographic apparatus and device manufacturing method
US7213963B2 · kind B2 · utility
160Cited by
20References
28Claims
0Family size
Assignee
Inventors
- Joeri Lof
- Erik Theodorus Maria Bijlaart
- Roelof Aeilko Siebrand Ritsema
- Frank Van Schaik
- Timotheus Franciscus Sengers
- Klaus Simon
- Joannes Theodoor De Smit
- Arie Jeffrey Den Boef
- Hans Butler
- Sjoerd Nicolaas Lambertus Donders
- Christiaan Alexander Hoogendam
- Marcus Adrianus Van De Kerkhof
- Aleksey Yurievich Kolesnychenko
- Mark Kroon
- Erik Roelof Loopstra
- Hendricus Johannes Maria Meijer
- Jeroen Johannes Sophia Maria Mertens
- Johannes Catharinus Hubertus Mulkens
- Joost Jeroen Ottens
- Alexander Straaijer
- Bob Streefkerk
- Helmar Van Santen
Key dates
| Filing date | Jun 1, 2004 |
| Grant date | May 8, 2007 |
| Priority date | — |
| Expiry date | Nov 8, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70883
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.