Patent · US Expired

Method and apparatus for controlling a calibration cycle or a metrology tool

US7262865B2 · kind B2 · utility

5Cited by
6References
15Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 26, 2004
Grant dateAug 28, 2007
Priority date
Expiry dateApr 2, 2025

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L22/20
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A method and apparatus for controlling when a calibration cycle is started for a metrology tool. The method and apparatus exploits a correlation between a drift of a first parameter (e.g., film thickness measurement drift) and a drift of a second parameter (e.g., CD measurement drift). One embodiment of the method comprises measuring a film thickness on one or more reference substrates to determine when a drift component of these measurements exceeds a pre-determined range and thereafter calibrating the metrology tool when the drift component of the film thickness measurements exceeds the pre-determined range. Generally, the drift of the film thickness measurement will occur prior to substantial drift of the CD measurement occurring.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.