Apparatus and methods for detecting overlay errors using scatterometry

US7289213B2 · kind B2 · utility

Assignee

• KLA-Tencor Technologies Corp. · US

Inventors

• Walter D. Mieher · Los Gatos, US
• Ady Levy · Sunnyvale, US
• Boris Golovanesky · Haifa, IL
• Michael Friedmann · Nesher, IL
• Ian Smith · Los Gatos, US
• Michael Adel · Zichron Ya'akov, IL
• Anatoly Fabrikant · Fremont, US

Key dates

• Filing date: Feb 23, 2004
• Grant date: Oct 30, 2007
• Expiry date: Apr 27, 2025

Classification

• Technology area (CPC G): Physics
• CPC primary: G01N2021/213
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

Disclose is a combined scatterometry mark comprising a scatterometry critical dimension (CD) or profile target capable of being measured to determine CD or profile information and a scatterometry overlay target disposed over the scatterometry CD or profile target, the scatterometry overlay target cooperating with the scatterometry CD or profile target to form a scatterometry mark capable of being measured to determine overlay.