Method and system for increasing product yield by controlling lithography on the basis of electrical speed data

US7325224B2 · kind B2 · utility

Assignee

• Advanced Micro Devices, Inc. · US

Inventors

• Rolf Seltmann · Dresden, DE
• Heiko Wagner · Dresden, DE
• Rolf Stephan · Dresden, DE

Key dates

• Filing date: Nov 12, 2004
• Grant date: Jan 29, 2008
• Expiry date: Dec 29, 2025

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70558
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

The electrical performance of sub-devices is detected and the corresponding measurement data is used to control a lithography process so as to compensate for any type of process variations during a manufacturing sequence.