Disposable hard mask for forming bit lines
US7341956B1 · kind B1 · utility
1Cited by
11References
19Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Apr 7, 2005 |
| Grant date | Mar 11, 2008 |
| Priority date | — |
| Expiry date | Apr 13, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/266
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method includes forming a group of disposable hard mask structures on a semiconductor device that includes a group of memory cells. The method further includes using the disposable hard mask structures to precisely control a junction profile of the memory cells.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.