System, method and apparatus for in-situ substrate inspection
US7397555B2 · kind B2 · utility
1Cited by
4References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 17, 2004 |
| Grant date | Jul 8, 2008 |
| Priority date | — |
| Expiry date | Jun 3, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/8822
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system for inspecting a substrate includes a camera and a light source. The camera is oriented toward a field of view. The field of view encompasses at least a first portion of a first surface of the substrate. The light source is oriented toward the field of view at a first angle β relative to the first surface of the substrate. A method for inspecting a substrate is also included.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.