Alan M. Schoepp
43Patents
15h-index
64Co-inventors
84Inventor score
Filing activity: Jun 23, 1998 → Jul 26, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6320320A | Method and apparatus for producing uniform process rates | Electricity | 357 | Expired |
| US7858898B2 | Bevel etcher with gap control | Electricity | 321 | Active |
| US6170429A | Chamber liner for semiconductor process chambers | Emerging Cross-Sectional Technologies | 144 | Expired |
| US9431268B2 | Isotropic atomic layer etch for silicon and germanium oxides | Electricity | 126 | Active |
| US6669783B2 | High temperature electrostatic chuck | Electricity | 63 | Expired |
| US6341574B1 | Plasma processing systems | Electricity | 61 | Expired |
| US6322661A | Method and apparatus for controlling the volume of a plasma | Electricity | 56 | Expired |
| US6361645B1 | Method and device for compensating wafer bias in a plasma processing chamber | Electricity | 51 | Expired |
| US6277237A | Chamber liner for semiconductor process chambers | Emerging Cross-Sectional Technologies | 39 | Expired |
| US6464843B1 | Contamination controlling method and apparatus for a plasma processing chamber | Electricity | 34 | Expired |
| US6377437B1 | High temperature electrostatic chuck | Emerging Cross-Sectional Technologies | 21 | Expired |
| US6302966A | Temperature control system for plasma processing apparatus | Electricity | 20 | Expired |
| US6074516A | High sputter, etch resistant window for plasma processing chambers | Electricity | 18 | Expired |
| US7943007B2 | Configurable bevel etcher | Electricity | 18 | Active |
| US8580078B2 | Bevel etcher with vacuum chuck | Electricity | 16 | Active |
| US8898928B2 | Delamination drying apparatus and method | Electricity | 12 | Active |
| US6306244A | Apparatus for reducing polymer deposition on substrate support | Emerging Cross-Sectional Technologies | 12 | Expired |
| US6567258B2 | High temperature electrostatic chuck | Emerging Cross-Sectional Technologies | 11 | Expired |
| US6518705B2 | Method and apparatus for producing uniform process rates | Electricity | 9 | Expired |
| US8721908B2 | Bevel etcher with vacuum chuck | Electricity | 9 | Active |
| US9982341B2 | Modular vaporizer | Mechanical Engineering; Lighting; Heating | 7 | Active |
| US9673037B2 | Substrate freeze dry apparatus and method | Electricity | 6 | Active |
| US6653791B1 | Method and apparatus for producing uniform process rates | Electricity | 6 | Expired |
| US7662254B2 | Methods of and apparatus for aligning electrodes in a process chamber to protect an exclusion area within an edge environ of a wafer | Electricity | 4 | Active |
| US9117860B2 | Controlled ambient system for interface engineering | Electricity | 3 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.