Arrangement of optical elements in a microlithographic projection exposure apparatus

US7474469B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Michael Totzeck · Schwäbisch Gmünd, DE
• Gerhart Fuerter · Ellwangen, DE
• Olaf Dittmann · Bopfingen, DE
• Karl-Heinz Schuster · Oberkochen, DE
• David Shafer · Fairfield, US
• Susanne Beder · Aalen, DE
• Wolfgang Singer · Aalen, DE

Key dates

• Filing date: Sep 22, 2005
• Grant date: Jan 6, 2009
• Expiry date: Sep 22, 2025

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70966
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

The invention relates to an arrangement of optical elements in a microlithographic projection exposure apparatus, particularly in a projection objective of a microlithographic projection exposure apparatus. The arrangement comprises a rigid first optical element, a rigid second optical element with a first optical surface and a second optical surface on opposite sides and a first liquid. The first optical element has a concave optical surface. The first side of the second optical element is facing the concave optical surface of the first optical element. The first liquid is at least partially filling the space between the first optical element and the second optical element.