Patent · US Active

Apparatus and methods for detecting overlay errors using scatterometry

US7564557B2 · kind B2 · utility

14Cited by

116References

7Claims

0Family size

Assignee

KLA-Tencor Technologies Corp. · US

Inventors

Walter D. Mieher · Los Gatos, US
Ady Levy · Sunnyvale, US
Boris Golovanesky · Haifa, IL
Michael Friedmann · Nesher, IL
Ian Smith · Los Gatos, US
Michael Adel · Zichron Ya'akov, IL
Anatoly Fabrikant · Fremont, US

Key dates

Filing date	Oct 29, 2007
Grant date	Jul 21, 2009
Priority date	—
Expiry date	Oct 29, 2027

Classification

Technology area (CPC G)Physics
CPC primaryG01N2021/213
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

Disclosed is a combined scatterometry mark comprising a scatterometry critical dimension (CD) or profile target capable of being measured to determine CD or profile information and a scatterometry overlay target disposed over the scatterometry CD or profile target, the scatterometry overlay target cooperating with the scatterometry CD or profile target to form a scatterometry mark capable of being measured to determine overlay.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.