Very narrow band, two chamber, high rep-rate gas discharge laser system
US7567607B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 1, 2006 |
| Grant date | Jul 28, 2009 |
| Priority date | — |
| Expiry date | Feb 1, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/2258
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An oscillator-amplifier gas discharge laser system and method is disclosed which may comprise a first laser unit which may comprise a first discharge region which may contain an excimer or molecular fluorine lasing gas medium; a first pair of electrodes defining the first discharge region containing the lasing gas medium, a line narrowing unit for narrowing a spectral bandwidth of output laser light pulse beam pulses produced in said first discharge region; a second laser unit which may comprise a second discharge chamber which may contain an excimer or molecular fluorine lasing gas medium; a second pair of electrodes defining the second discharge region containing the lasing gas medium; a pulse power system providing electrical pulses to the first pair of electrodes and to the second pair of electrodes producing gas discharges in the lasing gas medium between the respective first and second pair of electrodes, and laser parameter control mechanism modifying a selected parameter of a selected laser output light pulse beam pulse produced by said gas discharge laser system by controlling the timing of the occurrence of the gas discharge between the first pair of electrodes and the oc…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.